Optical device, exposure device, method for manufacturing flat panel display, and method for manufacturing device

ABSTRACT

An optical device includes a plurality of laser light sources, an output module having an optical modulator, and a time divider that is disposed between the plurality of laser light sources and the output module and that is configured to divide laser beams emitted from the plurality of laser light sources in time.

CROSS-REFERENCE TO RELATED APPLICATION

The present application is a continuation application of InternationalApplication PCT/JP2021/000578, filed on Jan. 8, 2021, which claimspriority on U.S. Patent Provisional Application No. 62/959,178, filed onJan. 10, 2020. The contents of the above applications are incorporatedherein by reference.

BACKGROUND Technical Field

The present invention relates to an optical device including a laserlight source, an exposure device, a method for manufacturing a flatpanel display, and a method for manufacturing a device.

Laser beams are used in various fields.

In a device that uses a laser beam, improvement of processing accuracyand improvement of energy efficiency are constantly desired. Forexample, reduction of energy loss of a laser beam, appropriate controlof output intensity of a laser beam, suppression of speckles,appropriately control of a beam output timing, and/or appropriatecontrol of an output beam waveform is desired.

SUMMARY

In an aspect of the present invention, an optical device includes aplurality of laser light sources; an output module having an opticalmodulator; and a time divider which is disposed between the plurality oflaser light sources and the output module and which is configured todivide laser beams emitted from the plurality of laser light sources intime.

In another aspect of the present invention, an optical device includes aplurality of laser light sources; a plurality of output modules eachhaving an optical modulator; and a time divider which is disposedbetween the plurality of laser light sources and the plurality of outputmodules and which is configured to divide laser beams emitted from theplurality of laser light sources in time.

In another aspect of the present invention, an optical device includes aplurality of laser light sources; a plurality of output modules eachhaving an optical modulator; a time divider which is disposed betweenthe plurality of laser light sources and the plurality of output modulesand which is configured to divide laser beams emitted from the pluralityof laser light sources in time; and a subsidiary divider disposedbetween the plurality of laser light sources and the time divider orbetween the time divider and the plurality of output modules.

In another aspect of the present invention, an optical device includes alaser light source; an output module; and a time divider which isdisposed between the laser light source and the output module and whichis configured to divide a laser beam emitted from the laser light sourcein time. The time divider divides the laser beam using a plurality ofreflecting surfaces.

In another aspect of the present invention, an optical device includes alaser light source; a plurality of output modules; and a time dividerwhich is disposed between the laser light source and the plurality ofoutput modules and which is configured to divide a laser beam emittedfront the laser light source in time. The time divider divides the laserbeam using a plurality of reflecting surfaces.

In another aspect of the present invention, an optical device includes alaser light source; an output module having an optical modulator; and anacousto-optic device disposed between the light source and the outputmodule.

In another aspect of the present invention, an optical device includes alaser light source; a plurality of output modules each having an opticalmodulator; and an acousto-optic device disposed between the laser lightsource and the output module.

In another aspect of the present invention, an optical device includes alaser light source configured to emit pulse light; an output modulehaving an optical modulator; a time divider which is disposed betweenthe laser light source and the output module and which is configured todivide the pulse light in time; and a controller configured to controldivision of the pulse light by the time divider on the basis of afrequency of the pulse light.

In another aspect of the present invention, an optical device includes alaser light source configured to emit pulse light; a plurality of outputmodules each having an optical modulator; a time divider which isdisposed between the laser light source and the plurality of outputmodules and which is configured to divide the pulse light in time; and acontroller configured to control division of the pulse light by the timedivider on the basis of a frequency of the pulse light.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a schematic diagram representing various form examples of alaser beam system (optical device) including a laser light source.

FIG. 2 is a schematic diagram representing various other form examplesof the laser beam system (optical device) including the laser lightsource.

FIG. 3 is a view showing an example of synthesis control of a pulselaser beam.

FIG. 4 is a view showing an example of synthesis control of a CW laserbeam.

FIG. 5 is a view showing an example of an output beam.

FIG. 6 is a view showing another example of the output beam.

FIG. 7 is a view showing an example in which a polygon mirror device isapplied as a time divider (rotation device).

FIG. 8 is a view showing an example in which a polygon mirror device isapplied as a time divider (rotation device).

FIG. 9 is a view showing an example in which an optical switch device isapplied as a time divider (rotation device).

FIG. 10 is a view showing an example in which an optical switch deviceis applied as a time divider (rotation device).

FIG. 11 is a view showing an example in which an optical switch deviceis applied as a subsidiary divider (dynamic time divider) and a polygonmirror device is applied as a time divider (dynamic time divider).

FIG. 12 is a view showing an example in which an electro-opticalmodulator is applied as a time divider and a polarization beam splitteris applied as a subsidiary divider (static divider).

FIG. 13 is a view showing an example in which an electro-opticalmodulator is applied as a subsidiary divider (dynamic time divider) anda polarization beam splitter is applied as a subsidiary divider (staticdivider).

FIG. 14 is a view showing an example including an aperture devicedisposed on an optical path.

FIG. 15 is a view schematically showing the entire configuration of anexposure device.

FIG. 16 is a view showing a configuration example of the exposuredevice.

FIG. 17 is a view for describing a relation between a repeatingfrequency of a laser beam and an operation frequency of an SLM.

FIG. 18 is a view for describing a combination of a light source and anoutput module.

FIG. 19 is a view showing an example of a configuration of the exposuredevice that does not include the SLM.

FIG. 20 is a view showing an example of a configuration of the exposuredevice including the SLM.

FIG. 21 is a view for describing a relation between a pattern line widthand an emission time.

FIG. 22 is a view for describing energy loss of a beam.

FIG. 23 is a view for describing time division of a beam.

FIG. 24 is a view for describing a deviation of a projection positionbetween a plurality of SLMs on the basis of an irradiation timing.

FIG. 25 is a view for describing mechanical and/or optical shiftadjustment.

FIG. 26 is a view for describing shift adjustment corresponding to ascan operation.

FIG. 27 is a view for describing shift adjustment corresponding toanother scan operation.

FIG. 28 is a view showing a configuration example of the exposure devicerelated to shift adjustment.

FIG. 29 is a view showing a configuration example of the exposuredevice.

FIG. 30 is a view showing a configuration example of the exposuredevice.

FIG. 31 is a view showing a configuration example of the exposuredevice.

FIG. 32 is a view showing a configuration example of the exposuredevice.

FIG. 33 is a view showing a configuration example of the exposuredevice.

FIG. 34 is a view showing a configuration example of the exposuredevice.

FIG. 35 is a view showing an example of a pattern exposure.

FIG. 36 is a view showing a configuration example of the exposure devicerelated to synchronous control.

FIG. 37 is a view for describing an example of rotation control of apolygon mirror.

FIG. 38 is a view for describing an example of synchronous control ofthe polygon mirror.

FIG. 39 is a view for describing an operation timing of a plurality ofdevices.

FIG. 40 is a view for describing an example of synchronous control of arotation plate.

FIG. 41 is a view for describing an example of synchronous control ofthe rotation plate on which additional machining is performed.

DESCRIPTION OF THE EMBODIMENTS

Hereinafter, an embodiment of the present invention will be describedwith reference to the accompanying drawings. The following detaileddescription of the present invention is merely exemplary and is notlimiting. The same or similar reference signs are used throughout thedrawings and the following detailed description.

FIG. 1 and FIG. 2 are schematic diagrams showing various form examplesof a laser beam system (optical device) including a laser light source.In each of the examples of FIG. 1(a), FIG. 1(b), FIG. 1(c), FIG. 1(d).FIG. 2(a), FIG. 2(b), FIG. 2(c), and FIG. 2(d), the laser beam systemincludes a laser light source 20.

In the embodiment, the laser beam system (optical device) includes thelaser light source 20, an output module 30, a controller 40, and a timedivider 50 optically disposed between (optically between) the laserlight source 20 and the output module 30.

Various types can be applied to the laser light source 20. For example,a gas laser (a He—Ne laser, an argon laser, a carbon dioxide gas laser,an excimer laser, a nitrogen laser, or the like), a semiconductor laser,a solid-state laser (an YAG laser, a neodymium (Nd) laser, a ruby laser,a fiber laser, a titanium laser or the like), a metal laser (a coppervapor deposition laser, a helium cadmium laser, a gold vapor depositionlaser, or the like), a liquid laser, or the like is exemplified as thelaser light source 20. The technology of the present disclosure can beapplied to various oscillation types such as pulse oscillation,continuous wave (CW) oscillation, and the like.

The output module 30 is set according to a purpose of the laser beam.For example, the laser beam is used for an optical device such as alaser machining device, a laser melting device, a laser welding device,a laser marking device, a laser measuring device, a semiconductorexposure device, a flat panel display exposure device, a circuitsubstrate exposure device, a laser illumination device, a laser displaydevice, a laser detection device, a laser propulsion device, a laserinspection device, a laser microscope, a laser medical device, or thelike. The technology of the present disclosure can be applied to devicesin various fields including these devices.

In a specific embodiment, the output module 30 includes a spatial lightmodulator (SLM) 60. For example, the SLM 60 includes a liquid crystalelement, a digital mirror device (digital micro-mirror device, DMD), amagneto optic spatial light modulator (MOSLM), or the like.

The time divider (a time distributor, a dynamic time divider, an opticaltime divider, an optical switch, an optical shutter, a dynamic switch, adynamic shutter, a dynamic separator, or an optical path switchingmachine) 50 is controlled by the controller 40 and configured to dividethe laser beam in time. For example, a polygon mirror device, agalvanometer mirror device, an electro-optical modulator (EOM), anacousto-optic modulator (AOM), a vibration device, another opticalswitch device (liquid crystal switch or the like), or the like isexemplified as the time divider 50. The time-divided beam can beselectively used. Further, the plurality of time-divided beams can besynthesized, mixed, and/or converged. For example, the beam selectivelyextracted from the time divider 50 enters the output module 30. In oneexample, the time-divided beam is guided to a plurality of optical pathsfor each predetermined span on a time axis. The plurality oftime-divided beams (plurality of distributed beams) are supplied to eachof the plurality of paths.

In a specific embodiment, the time divider 50 is controlled to be drivensynchronously with the SLM 60 of the output module 30. For example, thetime-divided beam corresponding to a driving timing of the SLM 60 issupplied to the SLM 60. For example, in general, the operation frequency(for example, an image updating frequency) of the SLM 60 is lower than arepeating frequency of the pulse beam. Among the time-divided beams, thebeam corresponding to the operation timing of the SLM 60 is selectivelyused. The remaining time-divided beams may be used for another purpose.In another embodiment, the time divider 50 can be controlled to bedriven non-synchronously with the SLM 60 of the output module 30.

In a specific embodiment, the laser beam system includes a plurality oflaser light sources 20. The number of the laser light sources 20 may bearbitrarily set. For example, the number of the laser light sources 20may be 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19,20, or more. In one example, the beams from the plurality of laser lightsources 20 are synthesized, mixed, and/or converged via a predetermineddevice, and enter the time divider 50. The beams from the plurality oflaser light sources 20 may have a relatively high energy value evenafter they are divided by the time divider 50. In another example, thebeams from the plurality of laser light sources 20 enter the timedivider 50 independently. In one example, the beams from the pluralityof pulse laser light sources 20 are set such that pulse widths and peakvalues (pulse waveforms, waveform profiles) are substantially the sameas each other. In another example, the beams from the plurality of pulselaser light sources 20 are set such that at least one of the pulsewidths and peak values (pulse waveforms, waveform profiles) aredifferent from each other.

In a state in which the plurality of laser light sources 20 and theoutput module 30 having the SLM 60 are combined with each other, forexample, energy loss of the laser beam is reduced, energy efficiency isimproved, output intensity of the laser beam is appropriatelycontrolled, and/or speckles are suppressed. In one example, the beamsfrom the time divider 50 are supplied to the SLM 60 at an appropriatetiming. In the SLM 60 to which the beams are limitedly supplied for anappropriate time, a high energy beam (high power beam) is output fromthe output module 30 together with reduction in energy loss in the SLM60.

In a specific embodiment, the laser beam system includes a plurality ofoutput modules 30. For example, a first time-divided beam is supplied tothe first output module 30, and a second time-divided beam is suppliedto the second output module 30. The number of the output modules 30 maybe arbitrarily set. For example, the number of the output modules 30 maybe 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20,25, 30, 35, 40, 45, 50, or more.

In a specific embodiment, each of the plurality of output modules 30 hasthe SLM 60. The plurality of SLMs 60 are driven synchronously ornon-synchronously. In one example, the first, second, third and fourthSLMs 60 are driven at the same timing corresponding to a certaintime-divided beam. In another example, the first and second SLMs 60 aredriven at the same timing corresponding to the first time-divided beam,and the third and fourth SLMs 60 are driven at another timingcorresponding to the second time-divided beam. In still another example,the first SLM 60 is driven at a timing corresponding to the firsttime-divided beam, the second SLM 60 is driven at another timingcorresponding to the second time-divided beam, the third SLM 60 isdriven at still another timing corresponding to the third time-dividedbeam, and the fourth SLM 60 is driven at yet another timingcorresponding to the fourth time-divided beam.

In a state in which the time divider 50 and the plurality of SLMs 60 arecombined, for example, energy loss of the laser beam is reduced, energyefficiency is improved, output intensity of the laser beam isappropriately controlled, the beam output timing is appropriatelycontrolled, and/or the output beam waveform is appropriately controlled.In one example, the beams from laser light source 20 are guided to theplurality of SLMs 60 to correspond to the driving timings of each of theplurality of SLMs 60. Reduction in shading period (beam nonuse period)of the beam is advantageous for improvement of energy efficiency,reduction in leak light, and/or avoidance of thermal effects.

In a specific embodiment, the laser beam system further includes asubsidiary divider (a time distributor, a dynamic time divider, anoptical time divider, an optical switch, an optical shutter, a dynamicswitch, a dynamic shutter, a dynamic separator, an optical pathswitching machine) 70 disposed optically between the laser light source20 and the time divider 50 or optically between the time divider 50 andthe output module 30. The subsidiary divider 70 includes a dynamicdivider or a static divider, and is configured to perform polarizationseparation, frequency separation, or separation in time of the laserbeam. The dynamic divider is a configuration for separating or dividingthe laser beam according to the driving of the divider, and the staticdivider is a configuration for separating or dividing the laser beamwithout driving the divider. For example, the same device as theabove-mentioned time divider or the like can be applied as the dynamicdivider. For example, a polarization beam splitter, a half mirror, adichroic mirror, a frequency separator, or the like is exemplified asthe static divider. In one example, the time divider 50 and the staticdivider 70 are sequentially disposed on the optical axis in a directionin which the beam advances. In another example, the static divider 70and the time divider 50 are sequentially disposed on the optical axis inthe direction in which the beam advances. Further, in another example,the time divider (a front position, a front stage time divider) 70 andthe time divider (a rear position, a rear stage time divider) 50 aresequentially disposed on the optical axis in the direction in which thebeam advances. In an example, the plurality of time dividers 50 and 70are combined. In another example, the time divider 50 and the pluralityof static dividers 70 are combined. In yet another example, theplurality of time dividers 50 and the one static divider 70 arecombined. In still another example, the plurality of time dividers 50and the plurality of static dividers 70 are combined. The number of thetime dividers 50 and the number of the subsidiary dividers 70 may bearbitrarily set. For example, a total number of the time dividers 50 andthe subsidiary dividers 70 may be 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12,13, 14, 15, 16, 17, 18, 19, 20, or more.

In a state in which the time dividers 50 and the static dividers 70 arecombined, for example, energy loss of the laser beam is reduced, energyefficiency is improved, output intensity of the laser beam isappropriately controlled, a beam output timing is appropriatelycontrolled, and/or an output beam waveform is appropriately controlled.In one example, a division number of the beam is increased, and/or thebeam is divided into a plurality of beams according to a wavelengthbandwidth.

In a state in which the time divider (front position) 70 and the timedivider (rear position) 50 are combined, for example, energy loss of thelaser beam is reduced, energy efficiency is improved, output intensityof the laser beam is appropriately controlled, a beam output timing isappropriately controlled, and/or an output beam waveform isappropriately controlled. In one example, a division number of the beamis increased, and/or use of a non-stable zone and/or a non-suitable zonein the time divider is avoided while the energy loss is suppressed.

In one example, the time-divided beam from the front position timedivider 70 in the first span on the time axis enters the rear positiontime divider 50, and a stable zone and/or a suitable zone of the rearposition time divider 50 is preferentially and/or appropriately(specifically and/or preferentially) used. Meanwhile, in the second spanon the time axis, the time-divided beam from the front position timedivider 70 does not enter the rear position time divider 50substantially, and use of the non-stable zone and/or the non-suitablezone of the rear position time divider 50 is avoided. For example, byalternately supplying the time-divided beams to the first time divider50 and the second time divider 50 at the rear position, use of thenon-stable zone and/or the non-suitable zone in the time divider 50 isavoided while substantially continuously using the beams. In otherwords, each of the plurality of rear position time dividers 50 has astable zone (suitable zone) and a non-stable zone (non-suitable zone).The plurality of rear position time dividers 50 are driven such that thestable state upon driving becomes different timings. The time-dividedbeam from the front position time divider 70 is parted to match thestable state of each of the time dividers 50 at the rear position.

In a specific embodiment, the output module 30 has an optical fiber. Theoptical fiber is configured to receive a plurality of time-divided beamsfrom the time divider 50 or the subsidiary divider 70. In one example,one optical fiber is provided with respect to one output module 30. Inanother example, a plurality of optical fibers are provided with respectto one output module 30. In this example, the plurality of time-dividedbeams from the plurality of optical fibers enter the one output module30.

In a specific embodiment, the laser beam system has the plurality ofoutput modules 30. Each of the plurality of output modules 30 includes afiber. For example, the time-divided beam at the first timing issupplied to the first optical fiber, and the time-divided beam at thesecond timing is supplied to the second optical fiber. In one example,one optical fiber is provided with respect to each of the plurality ofoutput modules 30. In another example, a plurality of optical fibers areprovided with respect to each of the plurality of output modules 30. Inthis example, the plurality of time-divided beams from the plurality ofoptical fibers enter each of the plurality of output modules 30.

FIG. 3 is a view showing an example of synthesis control of the pulselaser beam. FIG. 4 is a view showing an example of synthesis control ofa CW laser beam. FIG. 5 and FIG. 6 are views showing examples of anoutput beam. In each example, the laser beam, power of which wascontrolled, is output from the laser beam system.

In one example, the plurality of laser beams emitted from the pluralityof laser light sources 20 are synthesized. The synthesis can beperformed by an optical system including a lens, a beam splitter, ahalving, a mirror, or the like. The synthesized laser beam enters thetime divider 50, a synthesis beam (a synthesis beam of a first pulse)corresponding to the first repeating timing is guided to a first opticalfiber 80 via the time divider 50 (FIG. 3(b), FIG. 4(b)). A synthesisbeam (a synthesis beam of a second pulse) corresponding to the secondrepeating timing is guided to a second optical fiber 80 via the timedivider 50 (FIG. 3(c), FIG. 4(c)). A synthesis beam (a synthesis beam ofa third pulse) corresponding to the third repeating timing is guided toa third optical fiber 80 via the time divider 50 (FIG. 3(d), FIG. 4(d)).A synthesis beam (a synthesis beam of a fourth pulse) corresponding tothe fourth repeating timing is guided to a fourth optical fiber 80 viathe time divider 50 (FIG. 3(e), FIG. 4(e)). A synthesis beam (asynthesis beam of a fifth pulse) corresponding to the fifth repeatingtiming is guided to a fifth optical fiber 80 via the time divider 50(FIG. 3(f), FIG. 4(f)). The first, second, third, fourth and fifthrepeating timings are sequentially shifted in time. Accordingly, a highenergy (high power) synthesis beam is guided to each of the opticalfibers 80. For example, in the output module 30 having the SLM 60, asynthesis beam is guided to the optical fiber 80 according to theoperation timing of the SLM 60 at a relatively low speed.

In another example, the output power can be controlled to differ betweenthe plurality of output modules 30 according to an application of thecombination of the time division and the synthesis. For example, arelatively high energy (high power) beam is output from the first outputmodule 30 (FIG. 5(a)). An intermediate energy (intermediate power) beamis output from the second output module 30 (FIG. 5(b)). A relatively lowenergy (low power) beam is output from the third output module 30 (FIG.5(c)).

In further another example, the output beam waveform from the one orplurality of output modules 30 is appropriately controlled according tothe application of the combination of the time division and thesynthesis (FIG. 6(a), (b)). And/or, the beam output timing from the oneor plurality of output modules 30 is appropriately controlled (FIG.6(c)).

In a specific embodiment, a rotation device (rotation switch) is appliedas the time divider 50. A rotation device 50 is rotation-controlled bythe controller 40, and configured to divide the laser beam in time.

In one example, a polygon mirror device is applied as the rotationdevice 50 (FIG. 7 ). The beam from the laser light source 20 isreflected by each of a plurality of reflecting surfaces 52 of a polygonmirror 51 in a polygon mirror device 50. Each of a plurality of outputmodules 30 has an optical fiber 80 having an inlet section. In thepolygon mirror device 50, the beam is divided in time according to arotation angle of the polygon mirror 51. The beam reflected by thepolygon mirror 51 is directed to any one inlet section (incidencesurface) of the plurality of optical fibers 80 according to the rotationangle of the polygon mirror 51. That is, an angle of the reflectingsurface of the polygon mirror 51 with respect to the beam changesaccording to rotation of the polygon mirror 51, and a destination of thebeam reflected by the reflecting surface changes according to lapse oftime. For this reason, a beam with a first pulse from the laser lightsource 20 enters the first optical fiber, and a beam with a second pulseenters the second optical fiber, a position of which is different fromthat of the first optical fiber. The number of optical fibers 80 may bedisposed with respect to the one polygon mirror 51. The time-dividedbeam from the polygon mirror 51 is parted to any one of the plurality ofoptical fibers 80. In other words, the polygon mirror 51 switches theoptical fiber through which the beam enters. In addition, in otherwords, the polygon mirror 51 switches a position of the optical path ofthe beam. At least one lens 85 or 86 is disposed between the polygonmirror 51 and the optical fiber 80 according to necessity (FIG. 8 ). Forexample, when the inlet section (incidence surface) of the optical fiber80 and the reflecting surface of the polygon mirror 51 are conjugated, adeviation (positional deviation) of the incidence position of the beamwith respect to the optical fiber 80 based on the rotation of thepolygon mirror 51 is suppressed. Further, a slight change of theincidence angle of the beam with respect to the optical fiber 80 on thebasis of the rotation of the polygon mirror 51 is advantageous forsuppression of the speckles. Instead of the pulse beam, a CW beam canalso be applied to this type similarly.

In another example, a disk-shaped optical switch device is applied asthe rotation device 50 (FIG. 9 ). In the disk-shaped optical switchdevice 50, the beam is divided in time according to a rotation angle ofa rotation plate 55. For example, the beam from the laser light source20 is reflected by or transmitted through optical surfaces 56 and 57 ofthe rotation plate 55 in the optical switch device 50 according to therotation angle of the rotation plate 55 (FIG. 9(a)). The rotation plate55 has the transmission surface 56 and the reflecting surface 57arranged in the circumferential direction. For example, the beam passingthrough the rotation plate 55 is directed toward a first path “A,” andthe beam reflected by the rotation plate 55 is directed toward a secondpath “B” (FIG. 10 ). In addition, for example, the beam from the laserlight source 20 is reflected by the optical surfaces 56 and 57 of therotation plate 55 in different directions in the optical switch device50 according to the rotation angle of the rotation plate 55 (FIG. 9(b)).The rotation plate 55 has the first reflecting surface 56 and the secondreflecting surface 57, orientations of which are different from eachother. For example, the beam reflected by the first reflecting surface56 of the rotation plate 55 is directed toward the first path “A.” andthe beam reflected by the second reflecting surface 57 of the rotationplate 55 is directed toward the second path “B.” In addition, forexample, the beam from the laser light source 20 is reflected atdifferent height positions of the rotation plate 55 according to therotation angle of the rotation plate 55 (FIG. 9(c)). The rotation plate55 has the first reflecting surface 56 and the second reflecting surface57 having different height positions in a rotation axis direction. Forexample, the beam reflected by the first reflecting surface 56 of therotation plate 55 is directed toward the first path “A,” and the beampassing through the first reflecting surface of the rotation plate 55and reflected by the second reflecting surface 57 is directed toward thesecond path “B.” Further, a beam division number in the rotation typeoptical switch device 50 is not limited to 2. The division number may be3, 4, 5, 6, 7, 8, 9, 10, or more. For example, the rotation plate 55 mayhave three or more reflecting surfaces, orientations of which aredifferent from each other.

In a specific embodiment, the above-mentioned disk-shaped optical switchdevice is applied as the subsidiary divider (dynamic time divider) 70,and the polygon mirror device is applied as the time divider (dynamictime divider) 50 (FIG. 11 ). In this type, use of a corner portion(corner) of the polygon mirror 51 as a non-stable zone and/ornon-suitable zone 59 can be avoided. For example, the beam from theoptical switch device 70 in the first span on the time axis is directedtoward a first position in a reflecting surface 52 of the polygon mirrordevice 50 via the path “A,” and preferentially and/or appropriately(specifically and/or preferentially) reflected and time-divided by astable zone 58 of the polygon mirror 51 (a reflecting surface 52A). Thebeam from the optical switch device 70 in the second span on the timeaxis is directed toward the reflecting surface 52B different from thereflecting surface 52A of the polygon mirror device 50 via the path “B,”and preferentially and/or appropriately (specifically and/orpreferentially) reflected and time-divided by the stable zone 58 of thepolygon mirror 51 (the reflecting surface 52B). The beams arealternately supplied to the reflecting surface 52A and the reflectingsurface 52B of the polygon mirror 51. In the first time span, the beamdoes not enter the reflecting surface 52B, and use of a portion wherethe non-stable zones (corner portions) 59 of the polygon mirror 51 (thereflecting surface 52A), i.e., the reflecting surface and the reflectingsurface that form the polygon mirror 51 intersect each other (boundaryportion) is avoided. In the second time span, the beam does not enterthe reflecting surface 52A, and use of the non-stable zone (cornerportion) 59 of the polygon mirror 51 (the reflecting surface 52B) isavoided. Use of the non-stable zone in the polygon mirror 51 (the timedivider 50) is avoided while the beam is substantially continuously usedaccording to the parting of the time-divided beam. Avoidance of the useof the non-stable zone in the polygon mirror 51 (the time divider 50)will be described below in detail. Further, the reflecting surface 52Aand the reflecting surface 52B are changed over time by the rotation ofthe polygon mirror 51. That is, the reflecting surface 52A is a surfacewhere the beam enters the polygon mirror device 50 via the path “A.” Inaddition, the reflecting surface 52B is a surface where the beam entersthe polygon mirror device 50 via the path “B.”

In a specific embodiment, an electro-optical modulator (EOM, EO) isapplied as the time divider 50, and a polarization beam splitter (PBS)is applied as the subsidiary divider (static divider) 70 (FIG. 12 ). Inone example, the EOM 50 and the PBS 70 are sequentially disposed on theoptical axis in a direction in which the beam advances. In this type,the beam from the EOM 50 is branched off into a plurality of beamsaccording to a wavelength bandwidth by the PBS 70. For example, ap-polarization beam of the time-divided beam from the EOM 50 passesthrough the PBS 70. An s-polarization beam of the time-divided beam fromthe EOM 50 is reflected by the PBS 70.

In a specific embodiment, the electro-optical modulator (EOM, EO) isapplied as the subsidiary divider (dynamic time divider) 70, thepolarization beam splitter (PBS) is applied as the subsidiary divider(static divider) 70, and the plurality of polygon mirror devices areapplied as the time divider 50 (FIG. 13 ). The polygon mirrors 51A and51B of the plurality of polygon mirror devices are disposed with apositional relation parallel to the optical path. In one example, theEOM 70, the PBS 70 and polygon mirror 50 are sequentially disposed onthe optical axis in a direction in which the beam advances. In thistype, the beam from the EOM 70 is branched off according to thewavelength bandwidth by the PBS 70. The p-polarization beam passingthrough the PBS 70 is time-divided by the first polygon mirror 51A, andthe s-polarization beam reflected by the PBS 70 is time-divided by thesecond polygon mirror 51B.

In a specific embodiment, the laser beam system further includes anaperture device 90 optically disposed between the time divider 50 (orthe subsidiary divider 70) and the optical fiber 80 (or the outputmodule 30) (FIG. 14 ). The aperture device 90 has an aperture 91, and anarea of an opening through which the beam passes is controlled by thecontroller 40. The aperture 91 has a plurality of openings. In thistype, for example, among the beams from the time divider 50, the beampassing through the first opening of the aperture 91 enters the firstfiber as the first time-divided beam, and the beam passing through thesecond opening enters the second fiber as the second time-divided beam.In addition, a quantity of light of each of the time-divided beams isadjusted by controlling the opening area of the aperture 91. In thistype, it is preferably applied to a beam such as a CW laser beam or thelike, an emission time of which is relatively long.

In one embodiment, the laser beam system is applied to aphotolithography system configured to manufacture a device (anelectronic device or a micro device) such as a semiconductor element, aliquid crystal display element, an organic EL element, or the like. Inone example, a collective exposure type exposure device such as astepper or the like, or a scanning exposure type exposure device such asa scanning stepper or the like is used. For example, in the exposuredevice, a predetermined pattern is formed on each of shot regions of asubstrate such as a wafer, a glass plate, or the like, via a projectionoptical system.

In an example of the exposure device, a pattern formed on a mask (or areticule) held on a mask stage is transferred to a substrate throughirradiation of the exposure light via the projection optical system.

In another example of the exposure device, instead of the mask, avariable pattern is formed on a substance surface of a projectionoptical system using a spatial light modulator (SLM) (maskless typeexposure device).

At least a part of a configuration of various exposure devices, forexample, disclosures of US2009/0117494A1, US2010/0099049A1,US2013/0222781 A1, US2013/0278912A1, US2013/0314683A1, US2014/0320835A1,US2015/0077732A1 and U.S. Pat. No. 6,552,775B1 may be incorporatedherein by reference.

In a specific embodiment, the laser beam system is applied to theexposure device as a photography system configured to manufacture a flatpanel display (a liquid crystal display device, an organic EL displaydevice, or the like).

FIGS. 15 and 16 are views schematically showing a configuration of anembodiment of a maskless type exposure device 1000. The exposure device1000 includes a light source module 1100 including the laser lightsource 20, a distribution module (synthesis/distribution module) 1200including the time divider 50 and the subsidiary divider 70, anillumination system 1300 including an output module (including theoptical fiber 80, the illumination optical system (illumination system)1310, the SLM 60 and the projection optical system (projection lens)1330) 30, a substrate stage 1400 on which a substrate (workpiece) 1410is mounted, and a control system 1500 including the controller 40 andthe data transmission unit.

In FIG. 15 and FIG. 16 , the light source module 1100 radiates laserbeams with light energy. The beam from the light source module 1100enters the illumination system 1310 via the distribution module 1200.The beam from the illumination system 1310 illuminates the SLM 60. Thecontroller 40 generates pattern data on the basis of the exposurepattern formed on the substrate 1410. The controller 40 transmits thepattern data to the SLM 60, and controls the SLM 60. The SLM 60 iscontrolled by the controller 40, and guides the beam from theillumination system to the substrate 1410 on the basis of the patterndata (simply expressed as image data and image in some cases). Theprojection lens 1330 projects the beam from the SLM 60 onto thesubstrate 1410, and images the beam in a predetermined region on thesubstrate 1410. Further, when the exposure pattern is formed on thesubstrate 1410 by the plurality of SLMs 60, the controller 40 dividesthe generated pattern data for each of the SLMs 60, and transmits thedivided pattern data to each of the SLMs 60.

In the scan type exposure device using the SLM, the laser beam isemitted during movement of the substrate stage 1400 on which thesubstrate is placed, and the laser beam is guided to the SLM via theillumination optical system 1310. The image formed on the SLM ispreferably exposed with a single emission of the laser beam. When theimage formed on the SLM is exposed with emission of the laser beam twotimes or more, the same pattern data are projected onto the substrate oneach emission. Since the substrate 1410 moves also between the emissionand the emission of the laser beam by the substrate stage 1400, when thesame pattern data are projected onto the substrate, it will be exposedas if the image is flowing. When the scan speed is increased forthroughput improvement, a moving distance between the emission and theemission of the laser beam is lengthened, and the image will flow more.In order to increase a scan speed for throughput improvement and make itdifficult for the image to flow, one emission time must be shortened.When one emission time is short, since the energy of the laser beamradiated onto the substrate 1410 via the SLM is lowered, an exposuredefect (photosensitive defect) in which exposure energy is insufficientmay occur. In general, an operation frequency (for example, an imageupdating frequency) of the SLM is lower than an emission repeatingfrequency (an oscillation frequency) of the laser beam, for example,several kHz to tens kHz. In a comparative example of FIG. 17 , the laserbeam is 50 kHz (10W), and the SLM is 10 kHz. As shown in the comparativeexample of FIG. 17 and FIG. 18(a), an oscillation frequency having a lowfrequency in order to prevent the image from flowing and a high energylight source that does not generate an exposure defect are desired, butin consideration of the wavelength condition as well, the choice of thelaser light source is extremely limited at present. The numerical valueis an example, and the present invention is not limited thereto.

In the embodiment, as described using FIG. 3 and FIG. 4 first, a lowfrequency and high energy beam output is realized by a combination ofsynthesis and time division of the plurality of beams. In the example inFIG. 18(b), the distribution module 1200 synthesizes and time-dividesthe beams from five light sources 20. The beams emitted from the fivelight sources with a frequency of 50 kHz are synthesized and become ahigh energy beam. The synthesized beam (50 kHz, high energy) istime-divided and guided to the five SLMs 60 (and the five projectionlenses 1330) by the distribution module 1200. For this reason, a highenergy beam with a frequency of 10 kHz arrives at each of the first tofifth SLMs. Further, in both of the comparative example of FIG. 18(a)and the example of FIG. 18(b), the light sources with a total 50 W areused in five modules. Further, in the comparative example of FIG. 17 ,since the laser beam is 50 kHz (10W) and the SLM is 10 kHz, the light isdistributed (parted, switched) to the five SLMs by the distributionmodule 1200. The oscillation frequency of the laser beam is preferablyan integral multiple of the image updating frequency of the SLM. Inother words, the distribution module 1200 distributes the laser beaminto the number of SLMs, which is the integral multiple. The numericalvalue is an example, and the present invention is not limited thereto.

In the example, the intensity (for example, pulse energy, average power)E2 of the laser beam radiated to the one SLM is equal to or greater thanthe intensity (for example, pulse energy, average power) E1 of the laserbeam emitted from the one laser light source. For example, E2/E1 may beabout 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19,20, 25, 30, 35, 40, 45, 50, 100 or more. In addition, a frequency (anirradiation frequency) F2 of the beam radiated to the one SLM or animage updating frequency F3 of the SLM is lower than an emissionrepeating frequency (an oscillation frequency, a light source frequency)F1 of the laser light source. For example, F2/F1 (or F3/F1) may be about½, ⅓, ¼, ⅕, ⅙, 1/7, ⅛, 1/9, 1/10, 1/11. 1/12, 1/13, 1/14, 1/15, 1/16,1/17, 1/18, 1/19, 1/20, 1/25, 1/30, 1/35, 1/40, 1/45. 1/50, 1/100 orless.

Alternatively, as shown in FIG. 19 , the combination of the synthesisand the time division of the plurality of beams is also applicable to asystem (for example, an exposure device) that does not include the SLM.In the example of FIG. 19 (the exposure device 1000), a plurality oftime-divided beams (a plurality of distributed beams) are generated foreach predetermined span on a time axis. Beams with a relatively lowfrequency and high energy are supplied to each of the plurality ofmodules 30.

The number of the output modules 30 (a distribution number) can bearbitrarily set as described above. In the example of FIG. 20 , thedistribution module 1200 synthesizes and time-divides the beams from thefour light sources 20. The time-divided beams are supplied to each ofthe four SLMs 60 (the modules 30).

In the example of FIG. 21 , a line width of a pattern is 2 μm, and ascan speed is 400 mm/s. For example, when 10% of the line width of thepattern is allowed, and a necessary emission time is within 0.5 μs. Thenumerical value is an example, and the present invention is not limitedthereto.

In the comparative example of FIG. 22(a), the operation frequency (theimage updating frequency) of the SLM is 10 kHz. In the samespecification as the example of FIG. 21 , 10 kHz corresponds to 100 μs.In the CW light source, when the necessary emission time is 0.5 μs, ifthe beam is radiated to the SLM after 0.5 μs, since the image on the SLMis not updated, the same projection image is formed on the substrate1410 that is moving as if the image will flows as described above. Inorder to prevent the image from flowing, during the time from 0.5 μsuntil the next image on the SLM is updated, for example, the beam isblocked in the middle of the optical path from CW light source to theSLM such that the beam is not radiated to the SLM. In this case, thetime from 0.5 μs until the next image on the SLM is updated issubstantially a pause time. In the comparative example, only 1/200 ofthe energy from the light source will expose the substrate 1410.

Similarly, in the comparative example of FIG. 22(b), the operationfrequency (image updating frequency) of the SLM is 10 kHz. In the beamsfrom the pulse light source, only the beam at the timing when the SLMand the pulse light source are synchronized can be used. In thecomparative example, when the frequency of the light source is 400 kHz,operation frequency/light source frequency of SLM= 1/40, and only 1/40of the energy from the light source is used. That is, in 40 pulsesoscillated from the pulse light source, only one pulse radiates the SLM,in other words, 39 pulses do not radiate the SLM, and the 39 pulses donot contribute to the exposure of the substrate 1410. For this reason,in the comparative example of FIGS. 22(a) and 22(b), an exposure defect(photosensitive defect) in which exposure energy is insufficient mayoccur. The numerical value is an example, and the present invention isnot limited thereto.

In the example of FIG. 23 , the time-divided beams from the distributionmodule 1200 are guided to each of the plurality of SLMs 60 (theprojection lens 1330), which includes the first, second and third SLMs,in a non-scan direction (a non-scanning direction, a Y direction)crossing a scan direction (a scanning direction, an X direction) inwhich the substrate 1410 is moved during exposure. The first, second andthird SLMs are arranged and disposed in the non-scanning directioncrossing the scanning direction in which the substrate 1410 is movedduring exposure. Timing when the second SLM is irradiated with the beamis different from the timing when the first SLM is irradiated with thebeam. Similarly, irradiation timing of the third SLM is different fromirradiation timing of the first and second SLMs. For example, in theplurality of SLMs 60, the irradiation timing is sequentially shifted intime. Accordingly, the substrate 1410 can be exposed to the energy fromthe light source that does not contribute to the exposure shown in thecomparative example of FIGS. 22(a) and 22(b) by parting the beams to thedifferent SLMs.

As shown in FIG. 24 , in the exposure device, when the irradiationtiming differs between the plurality of SLMs, there is a possibilty thatthe images on the SLMs are updated at the same timing, and a projectionposition (exposure position) of a pattern may be deviated according to adifference in timing of the beam irradiation. For example, in comparisonwith the first pulse corresponding to the first SLM (SLM (1)), aprojection position of the second pulse corresponding to the second SLM(SLM (2)) is shifted in the scan direction. In addition, in comparisonwith the second pulse corresponding to the second SLM (SLM (2)), aprojection position of the third pulse corresponding to the third SLM(SLM (3)) is further shifted in the scan direction.

As shown in FIG. 25 , even when the irradiation timing differs betweenthe plurality of SLMs by mechanically and/or optically adjusting theexposure device, the deviation of the projection position (exposureposition) of the pattern is compensated. In the example, shapes,attachment positions, and/or postures of the plurality of SLMs aremechanically set such that the projection images from the plurality ofSLMs have a predetermined positional relation on the basis of thedeviation of the irradiation timing with respect to the plurality ofSLMs. Alternatively and/or additionally, the exposure device isoptically set such that the projection images from the plurality of SLMshave a predetermined positional relation on the basis of the deviationof the irradiation timing with respect to the plurality of SLMs. Forexample, a position of the projection image on the substrate 1410 ismoved by adjusting the optical element in the projection optical system(the projection lens) 1330, or a position of the projection image on thesubstrate 1410 is moved by moving the SLM with respect to the beam.

As shown in FIG. 26 , even when the irradiation timing differs betweenthe plurality of SLMs by adjusting drawing data of the patterns suppliedto the plurality of SLMs, the deviation of the projection position(exposure position) of the pattern is compensated. For example, the datacorresponding to the projection positions sequentially shifted in thescan direction are supplied to each of the plurality of SLMs. In theexample, on the basis of the deviation of the irradiation timing withrespect to the plurality of SLMs, at least some of the pattern data iscorrected such that the projection images from the plurality of SLMshave a predetermined positional relation. For example, the pattern datasupplied to at least one of the plurality of SLMs includes correctiondata shifted in the predetermined direction with respect to thereference position set on the basis of a difference in irradiationtiming. Alternatively and/or additionally, the pattern data may beprovided to determine a shift amount in the predetermined direction withrespect to the reference position on the basis of at least one of amoving speed of the substrate stage 1400, a display updating frequencyof the SLM, an oscillation frequency of a laser beam, a rotation speedof the polygon mirror device (rotation device) 50 as the time divider,the number of the SLMs 60 (the projection lens 1330), and the like.

As shown in FIG. 27 , in the exposure device configured to expose onepattern on the substrate 1410 by switching the scan direction (forexample, a moving direction of the substrate stage) between a positivedirection and a negative direction (between one direction and anopposite direction thereof), the data of the patterns supplied to theplurality of SLMs can be adjusted according to the scan direction at acorresponding timing. For example, the pattern data supplied to at leastone of the plurality of SLMs includes first correction data shifted inthe positive direction of the scan direction with respect to thereference position, and second correction data shifted in the negativedirection of the scan direction with respect to the reference position.

Alternatively and/or additionally, in the exposure device in which thescan direction (for example, the moving direction of the substratestage) is switched between the positive direction and the negativedirection (between one direction and an opposite direction thereof), theexposure device can be mechanically and/or optically adjusted for eachswitching timing in the scan direction.

As shown in FIG. 28 , the exposure device (the optical device) 1000 mayinclude a driving mechanism 1510 for mechanical adjustment, and adriving mechanism 1520 for optical adjustment. In addition, the exposuredevice 1000 may include a database 1530 (or a storage unit) in which aset parameter and/or a program for data correction is held. Such shiftadjustment can be performed, for example, based on output result of areference system 1540 including a reference sensor or the like. Further,when the SLM is attached to the exposure device 1000, in the case inwhich the attachment position is deviated in advance, the drivingmechanism 1510 may also be omitted. In addition, even when theattachment position of the SLM is deviated in advance, in order tocompensate an attachment error, the driving mechanism 1510 may also beused.

In one example of the exposure device 1000 in which timings when thebeams are radiated between the plurality of SLMs are different from eachother, the control system 1500 can control at least one of (a-1)mechanical adjustment of the exposure device 1000 using the drivingmechanism 1510. (a-2) optical adjustment of the exposure device 1000using the driving mechanism 1520, and (a-3) correction of the patterndata using the database 1530 based on the irradiation timing of each ofthe plurality of SLM. For example, shift adjustment in which all of theabove-mentioned (a-1), (a-2) and (a-3) are combined is executed.Alternatively, the shift adjustment is executed based on a combinationof one or two of the above-mentioned (a-1), (a-2) and (a-3). In theexample, correction of the pattern data is applied to relatively largeshift adjustment and/or relatively rough shift adjustment, andmechanical and/or optical adjustment is applied to relatively smallshift adjustment and/or relatively fine shift adjustment. In anotherexample, another method different from the above-mentioned method can beapplied.

Alternatively and/or additionally, the above-mentioned shift adjustmentcan be executed on the basis of the use timing of the beam. Even when apredetermined period in which the beam is non-used (for example, anon-use pulse) occurs, deviation of the projection position (exposureposition) of the pattern is compensated by the above-mentioned shiftadjustment. For example, a beam in a relatively unstable period is notused and a stable beam is selectively used while avoiding the deviationof the projection position of the pattern.

In the embodiment, as shown in FIG. 29 , the exposure device 1000includes the plurality of laser light sources 20, the plurality ofoutput modules 30 having the plurality of SLMs 60, and the polygonmirror device (rotation device) 50 as a time divider that is disposedbetween the plurality of laser light sources 20 and the output modules30 and that is configured to divide the laser beams emitted from theplurality of laser light sources 20 and synthesized in time. The beamsfrom the laser light sources 20 are reflected by each of the pluralityof reflecting surfaces 52 of the polygon mirror 51 in the polygon mirrordevice 50. The beams are divided in time according to the rotation angleof the polygon mirror 51. The beams reflected by the polygon mirror 51are parted to the plurality of SLMs 60 via the plurality of opticalfibers 80 according to the rotation angle of the polygon mirror 51. Inthe example, the time-divided beams from the polygon mirror 51 areparted to the five SLMs 60. For example, the beams corresponding to afirst pulse, a sixth pulse . . . enter the first SLM. The beamscorresponding to a second pulse, a seventh pulse . . . enters the secondSLM.

In the embodiment, as shown in FIG. 30 , the exposure device 1000includes the plurality of laser light sources 20, the plurality ofoutput modules 30 having the plurality of SLMs 60, the polygon mirrordevice (rotation device) 50 as a time divider that is disposed betweenthe plurality of laser light sources 20 and the plurality of outputmodules 30 and that is configured to divide the laser beams emitted fromthe plurality of laser light sources 20 and synthesized in time, and theoptical switch device 70 as the subsidiary divider 70 disposed betweenthe plurality of laser light sources 20 and the polygon mirror device50. In the example, the beam from the optical switch device 70 in thefirst span on the time axis advances toward the first position of thepolygon mirror device 50 via a path “A” and is reflected by the polygonmirror 51 (the reflecting surface 52A). The beam from the optical switchdevice 70 in the second span on the time axis advances toward the secondposition of the polygon mirror device 50 via a path “B” and is reflectedby the polygon mirror 51 (the reflecting surface 52B). The beams arealternately supplied to the first position and the second position ofthe polygon mirror 51. The beams are further divided according to therotation angle of the polygon mirror 51 in time. That is, in theexample, two time dividers are disposed in series along the opticalpath, and the beams are divided in two stages in time. In the example,the time-divided beams from the polygon mirror 51 are parted to the tenSLMs 60. For example, the beams corresponding to a first pulse, aneleventh pulse . . . enter the first SLM. The beams corresponding to asecond pulse, a twelfth pulse . . . enter the second SLM. In otherwords, the beams reflected by the reflecting surface 52A of the polygonmirror 51 are guided to a first SLM group (in FIG. 30 , the first SLM tofifth SLM), and the beams reflected by the reflecting surface 52B areguided to a second SLM group (in FIG. 30 , a sixth SLM to a tenth SLM).

In the embodiment, as shown in FIG. 31 , the exposure device 1000includes the plurality of laser light sources 20, the plurality ofoutput modules 30 having the plurality of SLMs 60, the plurality ofpolygon mirror devices (rotation devices) 50 as time dividers that isdisposed between the plurality of laser light sources 20 and theplurality of output modules 30 and that is configured to divide thelaser beams emitted from the plurality of laser light sources 20 andsynthesized in time, and the optical switch device 70 as a subsidiarydivider disposed between the plurality of laser light sources 20 and theplurality of polygon mirror devices 50. A plurality of polygon mirrors51A and 51B of the plurality of polygon mirror devices 50 are disposedto have a positional relation parallel to the optical path. In theexample, the beams from the optical switch device 70 in the first spanon the time axis advances toward the polygon mirror 51A and arereflected by the reflecting surface of the polygon mirror 51A. The beamsfrom the optical switch device 70 in the second span on the time axisadvances toward the polygon mirror 51B and are reflected by thereflecting surface of the polygon mirror 51B. The beams are furtherdivided according to the rotation angles of the polygon mirrors 51A and51B in time. In the example, the time-divided beams from the polygonmirror 51A are parted to the five SLMs 60. The time-divided beams fromthe polygon mirror 51B are parted to another five SLMs 60. For example,the beams corresponding to a first pulse, an eleventh pulse . . . entersthe first SLM. The beams corresponding to a sixth pulse, a sixteenthpulse . . . enters the sixth SLM. In other words, the beams reflected bythe polygon mirror 51A are guided to the first SLM group (in FIG. 31 ,the first SLM to the fifth SLM), and the beams reflected by the polygonmirror 51B are guided to the second SLM group (in FIG. 30 , the sixthSLM to the tenth SLM).

In the embodiment, as shown in FIG. 32 , the exposure device 1000includes the plurality of laser light sources 20, the plurality ofoutput modules 30 having the plurality of SLMs 60, the plurality ofoptical switch devices 50 as a time divider that are disposed betweenthe plurality of laser light sources 20 and the plurality of outputmodules 30 and that are configured to divide the laser beams emittedfrom the plurality of laser light sources 20 and synthesized in time,and the optical switch device 70 as a subsidiary divider disposedbetween the plurality of laser light sources 20 and the plurality ofoptical switch polygon mirror devices 50. A plurality of optical members55A, 55B and 55C of the plurality of optical switch devices 50 aredisposed to have a positional relation parallel to the optical path. Inthe example, the beams from the optical switch device 70 in the firstspan on the time axis advances to the optical member 55A and aretime-divided by the optical member 55A. The beams from the opticalswitch device 70 in the second span on the time axis advances to theoptical member 55B and are time-divided by the optical member 55B. Thebeams from the optical switch device 70 in the third span on the timeaxis advances to the optical member 55C and are time-divided by theoptical member 55C. In the example, the time-divided beams from theoptical member 55A are parted to the three SLMs 60. The time-dividedbeams from the optical member 55B are parted to another three SLMs 60.The time-divided beams from the optical member 55C are parted to stillanother three SLMs 60. For example, the beams corresponding to a firstpulse, a tenth pulse . . . enter the first SLM. The beams correspondingto a fourth pulse, a thirteenth pulse . . . enter the fourth SLM. Thebeams corresponding to a seventh pulse, a sixteenth pulse . . . enterthe seventh SLM. In other words, the time-divided beams are guided tothe first SLM group (in FIG. 32 , the first SLM to the third SLM) by theoptical member 55A, the time-divided beams are guided to the second SLMgroup (in FIG. 32 , the fourth SLM to the sixth SLM) by the opticalmember 55B, and the time-divided beams are guided to the third SLM group(in FIG. 32 , the seventh SLM to the ninth SLM) by the optical member55C.

In the embodiment, as shown in FIG. 33 , the exposure device 1000includes the laser light source 20, the plurality of SLMs 60, theplurality of polygon mirrors 51A, 51B and 51C as a time divider disposedbetween the laser light source 20 and the plurality of SLMs 60, and aplurality of optical switch devices 70 (optical members 75A and 75B) asa subsidiary divider disposed between the laser light source 20 and theplurality of polygon mirrors 51A, 51B and 51C. For example, the opticalmembers 75A and 75B are rotation plates in which reflecting regions andtransmitting regions are arranged side by side in the circumferentialdirection. In the example, the beams reflected by the optical member 75Ain the first span on the time axis advances toward the polygon mirror51A and are reflected by the reflecting surface of the polygon mirror51. The beams passing through the optical member 75A and reflected bythe optical member 75B in the second span on the time axis advancestoward the polygon mirror 51B and are reflected by the reflectingsurface of the polygon mirror 51B. The beams passing through the opticalmember 75B in the third span on the time axis advances toward thepolygon mirror 51C and are reflected by the reflecting surface of thepolygon mirror 51C. The beams are further divided according to therotation angles of the polygon mirrors 51A, 51B and 51C in time. Aslight change of the incidence angle of the beam based on the rotationsof the polygon mirrors 51A to 51C is advantageous for suppression of aspeckle.

In the embodiment, as shown in FIG. 34 , the exposure device 1000includes the plurality of laser light sources 20, the plurality of SLMs60, the plurality of polygon mirrors 51A, 51B, 51C, 51D, 51E and 51F asa time divider that are disposed between the plurality of laser lightsources 20 and the plurality of SLMs 60, and the plurality of opticalswitch devices 70 (the optical members 75A, 75B, 75C, 75D, 75E and 75F)as a subsidiary divider disposed between the plurality of laser lightsources 20 and the plurality of polygon mirrors 51A to 51F. For example,each of the optical members 75A to 75F is an acousto-optic modulator(AOM). In the example, the beams branched off by the optical member 75Cin the first span on the time axis are directed toward the polygonmirror 51C, and the beams branched off by the optical member 75F aredirected toward the polygon mirror 51F. The beams branched off by theoptical member 75B in the second span on the time axis are directedtoward the polygon mirror 51B, and the beams branched off by the opticalmember 75E are directed toward the polygon mirror 51E. The beamsbranched off by the optical member 75A in the third span on the timeaxis are directed toward the polygon mirror 51A, and the beams branchedoff by the optical member 75D are directed toward the polygon mirror51D. The beams are further divided according to the rotation angles ofthe polygon mirrors 51A to 51F in time. A slight change of the incidenceangle of the beam based on the rotations of the polygon mirrors 51A to51F is advantageous for suppression of a speckle.

In the example shown in FIG. 35 , the substrate 1410 is sequentiallyexposed by the beams from the plurality of output modules according tothe timing of the pulse emission. That is, a plurality of patterns aresequentially projected according to the timing of the pulse emission onthe substrate 1410 based on the beams from the plurality of outputmodules (1, 2, 3, . . . n).

In the embodiment, as shown in FIG. 36 , the exposure device 1000includes a master clock (an oscillator configured to emit a masterclock) 4010 that is a standard for synchronization. In the exposuredevice 1000 of FIG. 36 , each device of at least the laser light source20, the time divider (for example, the polygon mirror device) 50, thesubsidiary divider (for example, the optical switch device) 70, the SLM(for example, the DMD) 60, and the substrate stage 1400 is driven usingthe master clock 4010 as the standard. As shown in FIG. 37 , an originsensor 4020 is provided on each of the devices according to necessity.

For example, in FIG. 37 , the control system 1500 acquires informationrelated to the rotation of the polygon mirror 51 based on the outputdata from the origin sensor 4020. The control system 1500 can controleach device on the basis of the information from each device and theinformation from the master clock 4010.

As shown in FIG. 38 , the control system 1500 adjusts the rotationnumber of the polygon mirror 51 to match the clock frequency of themaster clock 4010 based on the rotation information of the polygonmirror 51. Further, the control system 1500 adjusts a phase of thepolygon mirror 51 to match the clock timing of the master clock 4010. Asa result, rotation of the polygon mirror 51 is controlled insynchronization with the master clock 4010. The subsidiary divider (theoptical switch device 70) (FIG. 36 ) can also be adjusted similarly.

In addition, the control system 1500 can control a trigger signal of animage display start in the SLM 60, i.e., an image updating frequency,using the master clock 4010 as the standard. The control system 1500 cancontrol the operation of the substrate stage 1400 that supports thesubstrate using the master clock 4010 as the standard. In addition, thecontrol system 1500 can control an operation of an SLM stage 1430 thatsupports the SLM 60 to solve the positional deviation with the substratestage 1400. By operating the SLM stage 1430, as described above, theposition of the projection image projected on the substrate 1410 can bemoved. As shown in FIG. 39 , the operation timing of each device isindividually adjusted as appropriate according to the reference of themaster clock 4010, and a relation of the operation timing between theplurality of devices is appropriately set.

Here, in the time divider 50 and the subsidiary divider 70, when thebeam enters a boundary portion between the plurality of regions providedfor time division, the emitted beam may be unstable. For example, in therotation plate 55 shown in FIG. 9(b) above, when the beam enters an apexsection or a bottom section located at a boundary portion between thefirst reflecting surface 56 and the second reflecting surface 57, thereflected beam may be scattered or the direction of the beam may bedisturbed.

As shown in FIG. 40 , by appropriately controlling the rotation of therotation plate 55 according to the oscillation timing of the laser lightsource 20, the beam entering into the boundary portion between the firstreflecting surface 56 and the second reflecting surface 57 in therotation plate 55 are avoided. For example, at the timing between a(n+1)^(th) pulse and a (n+2)^(th) pulse, the rotation of the rotationplate 55 is controlled such that an optical boundary (the uppermostsection or the lowermost section) in the rotation plate 55 is located atthe target irradiation position of the beam. Accordingly, use efficiencyof the beam is improved.

Alternatively and/or additionally, the optical boundary for division inthe time divider 50 (or the subsidiary divider 70) may be obtained byperforming machining different from the other region. In the example, asshown in FIG. 41 , additional machining is performed in the vicinity ofthe boundary (in the vicinity of the bottom section) between the firstreflecting surface 56 and the second reflecting surface 57 in therotation plate 55. For example, additional machining with relativelyhigh accuracy is performed in the vicinity of the boundary of therotation plate 55. Use efficiency of the beam is improved based on highsurface accuracy in the region in the vicinity of the optical boundary.

In the example of FIG. 41 , step differences 55A and 55B as traces ofadditional machining are formed in the vicinity of the boundary (in thevicinity of the bottom section) between the first reflecting surface 56and the second reflecting surface 57 in the rotation plate 55. Byappropriately controlling the rotation of the rotation plate 55according to the oscillation timing of the laser light source 20,entering of the beam to the step differences 55A and 55B in the rotationplate 55 is avoided. For example, the rotation of the rotation plate 55is controlled such that the step difference 55A in the rotation plate 55is located at the target irradiation position of the beam at a timingbetween a (n)^(th) pulse and a (n+1)^(th) pulse. In addition, therotation of the rotation plate 55 is controlled such that the stepdifference 55B in the rotation plate 55 is located at the targetirradiation position of the beam at a timing between a (n+2)^(th) pulseand a (n+3)^(th) pulse.

In the embodiment, an exposure device (1000) configured to expose apredetermined pattern on a substrate includes a light source (20), aspatial light modulator (60) configured to spatially modulate the lightfrom the light source (20) on the basis of pattern data that describes apredetermined pattern, a projection optical system (1330) configured toproject an projection image of a spatially modulated light to thesubstrate, and an optical path switching machine (50, 70) that isconfigured to switch an optical path of light sequentially oscillatedfrom the light source (20) and that is configured to switch the opticalpath of the light so as to sequentially guide the light to the spatialmodulators (60) which are provided in plural, and the optical pathswitching machine (50, 70) has a first switching machine (70) configuredto switch the optical path to any one of a first optical path and asecond optical path, and a second switching machine (50) that isconfigured to guide the light guided to the first optical path to aspatial light modulator (60) of a first group among the plurality ofspatial light modulators and that is configured to guide the lightguided to the second optical path to a spatial modulator (60) of asecond group among the plurality of spatial light modulators.

In the example, the first switching machine (70) has a first regionconfigured to guide the light oscillated from the light source (20)within a first period to the first optical path, and a second regionconfigured to guide the light oscillated from the light source (20)within a second period, which is different from the first period, to thesecond optical path.

For example, the first region reflects the light, and the second regiontransmits the light.

For example, the first region is provided to be inclined with respect tothe light at a first angle and reflects the light to guide the light tothe first optical path, and the second region is provided to be inclinedwith respect to the light at a second angle different from the firstangle and reflects the light to guide the light to the second opticalpath.

In another example, the second switching machine (50) has a firstreflecting surface (52A) configured to reflect the light to the spatiallight modulator (60) of the first group, and a second reflecting surface(52B) configured to reflect and guide the light to the spatial lightmodulator (60) of the second group.

The second switching machine (50) has a first switching machine (50,51A) configured to guide the light to the spatial light modulator (60)of the first group, and a second switching machine (50, 51B) configuredto guide the light to the spatial light modulator (60) of the secondgroup.

Alternatively and/or additionally, the exposure device (1000) includes adata transmission unit (1500) configured to transmit the pattern data tothe spatial light modulator (60), the spatial light modulator (60) has afirst spatial light modulator (60) and a second spatial light modulator(60) that are provided in plural side by side in a second directionwhich is a direction that crosses a first direction in which thesubstrate is moved during exposure, and the data transmission unit(1500) divides the pattern data into first pattern data transmitted tothe first spatial light modulator (60) and second pattern datatransmitted to the second spatial light modulator (60), and relativelyshifts positions of the first pattern data and the second pattern datarelated to the first direction.

Alternatively and/or additionally, the exposure device (1000) includes adata transmission unit (1500) configured to transmit the pattern data tothe spatial light modulator (60), the spatial light modulator (60) has afirst spatial light modulator (60) and a second spatial light modulator(60), and the data transmission unit (1500) divides the pattern datainto first pattern data transmitted to the first spatial light modulator(60) and second pattern data transmitted to the second spatial lightmodulator (60), and relatively shifts positions of the first patterndata and the second pattern data.

For example, the second switching machine (50) is a polygon mirror.

In the embodiment, the exposure device (1000) exposes a predeterminedpattern to a substrate that is moving in a first direction via the firstspatial light modulator (60) and the second optical modulator (60)disposed side by side in a second direction, which is a direction thatcrosses the first direction. The exposure device (1000) includes a lightsource (20), a data transmission unit (1500) configured to transmitpattern data described on the basis of the predetermined pattern to thefirst spatial light modulator (60) and the second spatial lightmodulator (60), a first projection optical system (1330) configured toproject a projection image of a light, which is from the light source(20) and which is spatially modulated by the first spatial modulator(60), to the substrate on the basis of the first pattern data, which isa part of the pattern data, transmitted by the transmission unit (1500),the second spatial light modulator (60) configured to spatially modulatethe light which is from the light source (20) on the basis of the secondpattern data, which is the other part of the pattern data, transmittedby the transmission unit (1500), a second projection optical system(1330) configured to project a projection image of the secondarilyspatially modulated light to the substrate, and an optical pathswitching machine (50) configured to switch an optical path of the lightsequentially oscillated from the light source (20) and guides the lightin sequence of the first spatial modulator (60) and the second spatialmodulator (60), and the data transmission unit (1500) divides thepattern data into the first pattern data and the second pattern data andrelatively shifts positions of the first pattern data and the secondpattern data related to the first direction.

In the example, the exposure device (1000) includes an oscillator (4010)configured to emit a master clock that synchronizes at least two of thelight source (20), the spatial light modulator (60) and the optical pathswitching machine (50).

For example, the exposure device further includes a synthesizer (1200)configured to synthesize the light emitted from each of the plurality oflight sources (20), and the optical path switching machine (50) switchesthe optical path of the light synthesized by the synthesizer (1200).

In the embodiment a method for manufacturing a flat panel displayincludes exposing the substrate using the exposure device (1000), anddeveloping the exposed substrate.

In the embodiment, a method for manufacturing a device includes exposingthe substrate using the exposure device (1000), and developing theexposed substrate.

Further, the exposure device 1000 may also be used as, for example, asemiconductor photolithography system for exposing an integrated circuitpattern on a wafer or a photolithography system for manufacturing a thinfilm magnetic head.

Further, while it has been described in the above-mentioned plurality ofembodiments that beam output with a low frequency and high energy isrealized by a combination of synthesis and time division of a pluralityof beams, there is no limitation thereto. When the beams with highenergy are output from the laser light source, the plurality of beamsmay not be synthesized.

Further, the synthesis of the plurality of beams includes a case inwhich optical axes of the laser beams emitted from the plurality oflight sources are matched and synthesized. In addition, even when theoptical axes of the laser beams emitted from the plurality of lightsource do not match each other, the case in which these optical axes aresubstantially close to each other includes that the beams with highenergy are output or that the beams are synthesized.

The above-mentioned photolithography system can be constructed toassemble various sub-systems such that predetermined mechanicalaccuracy, electrical accuracy, and optical accuracy are maintained. Inorder to maintain the various types of accuracy before and after theassembly, each of the optical systems is adjusted to accomplish theoptical accuracy thereof. Similarly, all mechanical systems andelectrical systems are adjusted to accomplish mechanical accuracy andelectrical accuracy. In a process of assembling the sub-systems to thephotolithography system, a mechanical interface between the sub-systems,electric circuit wiring connection, and pneumatic pressure pipelineconnection are included. Prior to assembly of the photolithographysystem from various sub-systems, a process of assembling the sub-systemsis also provided. Once various sub-systems are used and aphotolithography system is assembled, all adjustments are performed inorder to reliably maintain the accuracy in a complete photolithographysystem. Further, it is desired to manufacture an exposure system in aclean room in which a temperature and cleanliness are controlled.

In addition, the substrate to be exposed is not limited to the glassplate, and another substance such as a wafer, a ceramic substrate, afilm member, mask blanks, or the like, may be provided. In addition,when an exposure object is a substrate for a flat panel display, athickness of the substrate is not particularly limited, and for example,a member having a film shape (a sheet-shaped member having flexibility)is also included. Further, the exposure device of the embodiment isparticularly effective when a substrate with a single side or a diagonallength of 500 mm or more is an exposure object.

An electronic device such as a liquid crystal display element (or asemiconductor element) or the like is manufactured through a step ofperforming a function/performance design of the device, a step offabricating a mask (or a reticule) on the basis of the design step, astep of fabricating a glass substrate (or a wafer), a lithography stepof transferring a pattern of the mask (reticule) to the glass substrateusing the exposure device of the above-mentioned embodiment and anexposure method thereof, a development step of developing the exposedglass substrate, an etching step of removing an exposure member of aportion other than a portion in which resist is remained by etching, aresist removal step of removing the resist that is no longer neededafter etching, a device assembly step, an inspection step, and the like.In this case, in the lithography step, since the above-mentionedexposure method is executed using the exposure device of the embodimentand the device pattern is formed on the glass substrate, highlyintegrated devices can be manufactured with high productivity.

The system of the present disclosure described above can achieve thepurpose and provide the effect. These are examples of the embodiment,and there is no intention to limit the configuration or design indetail.

1.-13. (canceled)
 14. An exposure device configured to expose apredetermined pattern on a substrate, the exposure device comprising: alight source; a spatial light modulator configured to spatially modulatethe light from the light source on the basis of pattern data thatdescribe the predetermined pattern; a projection optical systemconfigured to project a projection image of the spatially modulatedlight to the substrate; and an optical path switching machine that isconfigured to switch an optical path of a light sequentially oscillatedfrom the light source and that is configured to sequentially guide thelight to the spatial modulators that are provided in plural, wherein theoptical path switching machine has a first switching machine configuredto switch the optical path to any one of a first optical path and asecond optical path, and a second switching machine that is configuredto guide the light guided to the first optical path to a spatial lightmodulator of a first group among the plurality of spatial lightmodulators and that is configured to guide the light guided to thesecond optical path to a spatial modulator of a second group among theplurality of spatial light modulators.
 15. The exposure device accordingto claim 14, wherein the first switching machine has a first regionconfigured to guide the light oscillated from the light source within afirst period to the first optical path, and a second region configuredto guide the light oscillated from the light source within a secondperiod, which is different from the first period, to the second opticalpath.
 16. The exposure device according to claim 15, wherein the firstregion reflects the light, and the second region transmits the light.17. The exposure device according to claim 15, wherein the first regionis provided to be inclined with respect to the light at a first angleand reflects the light to guide the light to the first optical path, andthe second region is provided to be inclined with respect to the lightat a second angle different from the first angle and reflects the lightto guide the light to the second optical path.
 18. The exposure deviceaccording to claim 14, wherein the second switching machine has a firstreflecting surface configured to reflect the light to the spatial lightmodulator of the first group, and a second reflecting surface configuredto reflect and guide the light to the spatial light modulator of thesecond group.
 19. The exposure device according to claim 14, wherein thesecond switching machine has a first switching machine configured toguide the light to the spatial light modulator of the first group, and asecond switching machine configured to guide the light to the spatiallight modulator of the second group.
 20. The exposure device accordingto claim 14, further comprising a data transmission unit configured totransmit the pattern data to the spatial light modulator, wherein thespatial light modulator has a first spatial light modulator and a secondspatial light modulator that are provided in plural side by side in asecond direction which is a direction that crosses a first direction inwhich the substrate is moved during exposure, and the data transmissionunit divides the pattern data into first pattern data transmitted to thefirst spatial light modulator and second pattern data transmitted to thesecond spatial light modulator, and relatively shifts positions of thefirst pattern data and the second pattern data related to the firstdirection.
 21. The exposure device according to claim 14, furthercomprising a data transmission unit configured to transmit the patterndata to the spatial light modulator, wherein the spatial light modulatorhas a first spatial light modulator and a second spatial lightmodulator, and the data transmission unit divides the pattern data intofirst pattern data transmitted to the first spatial light modulator andsecond pattern data transmitted to the second spatial light modulator,and relatively shifts positions of the first pattern data and the secondpattern data.
 22. The exposure device according to claim 14, wherein thesecond switching machine is a polygon mirror.
 23. An exposure deviceconfigured to expose a predetermined pattern to a substrate that ismoving in a first direction via first spatial light modulator and asecond optical modulator disposed side by side in a second direction,which is a direction that crosses the first direction, the exposuredevice comprising: a light source; a data transmission unit configuredto transmit pattern data described on the basis of the predeterminedpattern to the first spatial light modulator and the second spatiallight modulator; a first projection optical system configured to projecta projection image of a light, which is from the light source and whichis spatially modulated by the first spatial modulator, to the substrateon the basis of first pattern data, which is a part of the pattern data,transmitted by the transmission unit, a second spatial light modulatorconfigured to spatially modulate the light which is from the lightsource on the basis of second pattern data, which is the other part ofthe pattern data, transmitted by the transmission unit, a secondprojection optical system configured to project a projection image ofthe secondarily spatially modulated light to the substrate, and anoptical path switching machine configured to switch an optical path ofthe light sequentially oscillated from the light source and guides thelight in sequence of the first spatial modulator and the second spatialmodulator, wherein the data transmission unit divides the pattern datainto the first pattern data and the second pattern data, and relativelyshifts positions of the first pattern data and the second pattern datarelated to the first direction.
 24. The exposure device according toclaim 14, further comprising an oscillator configured to emit a masterclock that synchronizes at least two of the light source, the spatiallight modulator, and the optical path switching machine.
 25. Theexposure device according to claim 14, further comprising a synthesizerconfigured to synthesize the light emitted from each of the plurality oflight sources, wherein the optical path switching machine switches theoptical path of the light synthesized by the synthesizer.
 26. A methodfor manufacturing a flat panel display comprising: exposing thesubstrate using the exposure device according to claim 14, anddeveloping the exposed substrate.
 27. A method for manufacturing adevice comprising: exposing the substrate using the exposure deviceaccording to claim 14; and developing the exposed substrate.